Designed for Talbot-Lau interferometry and edge illumination imaging from 1 keV to 100 keV, our gratings have produced excellent results for our customers. Gratings are arrays of apertures characterized by the period, the duty cycle (metal width/period), the material height, and the layout area. Microworks can supply gratings with layout sizes ranging from 60 x 20 mm² to 160 x 90 mm². We additionally have experience in stitching/tiling gratings to even larger areas.
See the Spec Sheet below for our standard set of gratings. Custom gratings are available upon request.
Standard Grating Set
Parameter
Details
Design Energy
40 KeV
Grating Periods
6.0 µm
Layout Area of G2
Diameter 70 mm
Absorber Material & Height
Gold 120 ~ 160 µm
Duty Cycle of G0 and G2
0.55
Duty Cycle of G1
0.5
Substrate of G0 and G2
Graphite, 400 µm, 4 inch wafer format
Substrate of G1
Silicon, 200µm, double side polished, 4 inch wafer format
We use different substrates for different purposes. For example, polyimide for low-energy applications, silicon for phase gratings, and graphite for absorption gratings.
Our standard set of gratings features 6 µm period parallel lines and is designed for use at 40 keV.
Other Symmetric Grating Sets:
• 8 keV, 2.4 µm period, 50 mm x 50 mm
• 20 keV, 4.8 µm period, diameter: 70 mm
• 55 keV, 8.0 µm period, diameter: 100 mm
Custom Grating Kits
We offer custom production of grating kits to your specifications.
Options include adaptation to other energies, layout area, 2D gratings (hole arrays for Hartmann sensors), different periods.
